发明授权
US07767779B2 High index and high impact resistant polythiourethane/urea material, method of manufacturing same and its use in the optical field
有权
高指数和高抗冲击性聚硫氨酯/尿素材料，其制造方法及其在光学领域的应用
- 专利标题： High index and high impact resistant polythiourethane/urea material, method of manufacturing same and its use in the optical field
- 专利标题（中）： 高指数和高抗冲击性聚硫氨酯/尿素材料，其制造方法及其在光学领域的应用
-
申请号： US09992054申请日： 2001-11-14
-
公开(公告)号： US07767779B2公开(公告)日： 2010-08-03
- 发明人: Aref Ben Ahmed Jallouli , Joey O. Obordo , Yassin Yusef Turshani , Peiqi Jiang , Fadi O. Adileh , Steven Weber
- 申请人： Aref Ben Ahmed Jallouli , Joey O. Obordo , Yassin Yusef Turshani , Peiqi Jiang , Fadi O. Adileh , Steven Weber
- 申请人地址： FR Charenton-le-Pont
- 专利权人： Essilor International Compagnie Generale d'Optique
- 当前专利权人： Essilor International Compagnie Generale d'Optique
- 当前专利权人地址： FR Charenton-le-Pont
- 代理机构： Fulbright & Jaworski L.L.P.
- 主分类号： C08G18/52
- IPC分类号： C08G18/52 ; C08G18/10 ; C08G18/32 ; C08G18/38
摘要：
A transparent, non elastomeric, high index, impact resistant polythiourethane/urea material comprising the reaction product of: a) at least one (α, ω)-diiso(thio)cyanate cycloaliphatic or aromatic prepolymer having a number average molecular weight ranging from 100 to 3000 gmol−1, and b) at least one primary diamine, in an equivalent molar ratio amine function/iso(thio)cyanate function from 0.5 to 2, preferably from 0.90 to 1.10, wherein, said prepolymer and diamine are free from disulfide (—S—S—) linkage and at least one of the prepolymer or the diamine contains one or more S atoms in its chain.
公开/授权文献
信息查询
