Invention Grant
- Patent Title: Organometallic compounds
- Patent Title (中): 有机金属化合物
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Application No.: US12228346Application Date: 2008-08-12
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Publication No.: US07767840B2Publication Date: 2010-08-03
- Inventor: Deodatta Vinayak Shenai-Khatkhate , Michael Brendan Power
- Applicant: Deodatta Vinayak Shenai-Khatkhate , Michael Brendan Power
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agent S. Matthew Cairns
- Main IPC: C07F7/30
- IPC: C07F7/30
Abstract:
Organometallic compounds suitable for use as vapor phase deposition precursors for Group IV metal-containing films are provided. Methods of depositing Group IV metal-containing films using certain organometallic precursors are also provided. Such Group IV metal-containing films are particularly useful in the manufacture of electronic devices.
Public/Granted literature
- US20090156852A1 Organometallic compounds Public/Granted day:2009-06-18
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