Invention Grant
US07768048B2 Infrared sensor IC, and infrared sensor and manufacturing method thereof
有权
红外线传感器IC及红外线传感器及其制造方法
- Patent Title: Infrared sensor IC, and infrared sensor and manufacturing method thereof
- Patent Title (中): 红外线传感器IC及红外线传感器及其制造方法
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Application No.: US10571287Application Date: 2004-09-09
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Publication No.: US07768048B2Publication Date: 2010-08-03
- Inventor: Koichiro Ueno , Naohiro Kuze , Yoshitaka Moriyasu , Kazuhiro Nagase
- Applicant: Koichiro Ueno , Naohiro Kuze , Yoshitaka Moriyasu , Kazuhiro Nagase
- Applicant Address: JP Tokyo
- Assignee: Asahi Kasei EMD Corporation
- Current Assignee: Asahi Kasei EMD Corporation
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: JP2003-316281 20030909
- International Application: PCT/JP2004/013158 WO 20040909
- International Announcement: WO2005/027228 WO 20050324
- Main IPC: H01L31/062
- IPC: H01L31/062 ; H01L31/113

Abstract:
An infrared sensor IC and an infrared sensor, which are extremely small and are not easily affected by electromagnetic noise and thermal fluctuation, and a manufacturing method thereof are provided. A compound semiconductor that has a small device resistance and a large electron mobility is used for a sensor (2), and then, the compound semiconductor sensor (2) and an integrated circuit (3), which processes an electrical signal output by the compound semiconductor sensor (2) and performs an operation, are arranged in a single package using hybrid formation. In this manner, an infrared sensor IC that can be operated at room temperature can be provided by a microminiature and simple package that is not conventionally produced.
Public/Granted literature
- US20070090337A1 Infrared sensor ic, and infrared sensor and manufacturing method thereof Public/Granted day:2007-04-26
Information query
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