Invention Grant
- Patent Title: Ferroelectric thin films
- Patent Title (中): 铁电薄膜
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Application No.: US11774793Application Date: 2007-07-09
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Publication No.: US07768050B2Publication Date: 2010-08-03
- Inventor: Andrew Marshall Rappe , Na Sai , Alexie Michelle Kolpak
- Applicant: Andrew Marshall Rappe , Na Sai , Alexie Michelle Kolpak
- Applicant Address: US PA Philadelphia
- Assignee: The Trustees of the University of Pennsylvania
- Current Assignee: The Trustees of the University of Pennsylvania
- Current Assignee Address: US PA Philadelphia
- Agency: Woodcock Washburn, LLP
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/94 ; H01L21/00
Abstract:
Ferroelectric structures and methods of making the structures are presented. The ferroelectric structures can include an electrode in contact with a ferroelectric thin film. The contact can be arranged so that a portion of the atoms of the ferroelectric thin film are in contact with at least a portion of the atoms of the electrode. The electrode can be made of metal, a metal alloy, or a semiconducting material. A second electrode can be used and placed in contact with the ferroelectric thin film. Methods of making and using the ferroelectric structures are also presented.
Public/Granted literature
- US20080062615A1 FERROELECTRIC THIN FILMS Public/Granted day:2008-03-13
Information query
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