Invention Grant
- Patent Title: DRAM including a vertical surround gate transistor
- Patent Title (中): DRAM包括垂直环绕栅极晶体管
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Application No.: US11188507Application Date: 2005-07-25
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Publication No.: US07768051B2Publication Date: 2010-08-03
- Inventor: Todd R. Abbott
- Applicant: Todd R. Abbott
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Knobbe Martens Olson & Bear, LLP
- Main IPC: H01L27/108
- IPC: H01L27/108

Abstract:
DRAM memory cells having a feature size of less than about 4F2 include vertical surround gate transistors that are configured to reduce any short channel effect on the reduced size memory cells. In addition, the memory cells may advantageously include reduced resistance word line contacts and reduced resistance bit line contacts, which may increase a speed of the memory device due to the reduced resistance of the word line and bit line contacts.
Public/Granted literature
- US20070090363A1 Dram including a vertical surround gate transistor Public/Granted day:2007-04-26
Information query
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