Invention Grant
US07768101B2 Semiconductor device having an insulated gate bipolar transistor and a free wheel diode
有权
具有绝缘栅双极晶体管和续流二极管的半导体器件
- Patent Title: Semiconductor device having an insulated gate bipolar transistor and a free wheel diode
- Patent Title (中): 具有绝缘栅双极晶体管和续流二极管的半导体器件
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Application No.: US11684772Application Date: 2007-03-12
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Publication No.: US07768101B2Publication Date: 2010-08-03
- Inventor: Kenji Suzuki , Hideki Takahashi , Yoshifumi Tomomatsu
- Applicant: Kenji Suzuki , Hideki Takahashi , Yoshifumi Tomomatsu
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-292486 20061027
- Main IPC: H01L27/082
- IPC: H01L27/082 ; H01L27/102 ; H01L29/70 ; H01L31/11

Abstract:
A p-type collector region of an IGBT and an n-type cathode region of a free wheel diode are alternately formed in a second main surface of a semiconductor substrate. A back electrode is formed on the second main surface so as to be in contact with both of the p-type collector region and the n-type cathode region, and has a titanium layer, a nickel layer and a gold layer that are successively stacked from the side of the second main surface. A semiconductor device capable of obtaining a satisfactory ON voltage in any of conduction of an insulated gate field effect transistor and conduction of the free wheel diode as well as a manufacturing method thereof can thus be obtained.
Public/Granted literature
- US20080102576A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2008-05-01
Information query
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