An exposure apparatus, which forms a latent image pattern on a substrate using an exposure beam, includes a first structure which supports a projection unit which projects an exposure beam onto a substrate, a first supporting leg which includes a first actuator and supports the first structure, a first state detector which detects a state of the first structure, a second structure which supports a substrate stage which aligns the substrate, a second supporting leg which includes a second actuator and supports the second structure, a second state detector which detects a state of the second structure, and a control unit which controls, on the basis of a signal from the first state detector and a signal from the second state detector, the first actuator and the second actuator so as to synchronize the first structure and the second structure with each other.