Invention Grant
US07768627B2 Illumination of a patterning device based on interference for use in a maskless lithography system
有权
基于用于无掩模光刻系统的干涉的图案形成装置的照明
- Patent Title: Illumination of a patterning device based on interference for use in a maskless lithography system
- Patent Title (中): 基于用于无掩模光刻系统的干涉的图案形成装置的照明
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Application No.: US11763276Application Date: 2007-06-14
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Publication No.: US07768627B2Publication Date: 2010-08-03
- Inventor: Huibert Visser , Hedser Van Brug
- Applicant: Huibert Visser , Hedser Van Brug
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/42
Abstract:
A lithographic apparatus in which beams of radiation are projected onto an array of individually controllable elements, such that the beams interfere. Radiation that is further modulated by the array of individually controllable elements is projected onto a substrate.
Public/Granted literature
- US20080309906A1 Illumination of a Patterning Device Based on Interference for Use in a Maskless Lithography System Public/Granted day:2008-12-18
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