Invention Grant
- Patent Title: Determining copper concentration in spectra
- Patent Title (中): 测定光谱中的铜浓度
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Application No.: US11868911Application Date: 2007-10-08
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Publication No.: US07768659B2Publication Date: 2010-08-03
- Inventor: Dominic J. Benvegnu , Jeffrey Drue David , Boguslaw A. Swedek , Jimin Zhang , Harry Q. Lee
- Applicant: Dominic J. Benvegnu , Jeffrey Drue David , Boguslaw A. Swedek , Jimin Zhang , Harry Q. Lee
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson
- Main IPC: G01B9/08
- IPC: G01B9/08 ; G01B11/28
Abstract:
Methods of subtracting the copper contribution to spectra obtained from a substrate during chemical mechanical polishing are described.
Public/Granted literature
- US20080130000A1 DETERMINING COPPER CONCENTRATION IN SPECTRA Public/Granted day:2008-06-05
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