Invention Grant
- Patent Title: Manufacturing method of light-collecting device, light-collecting device and phase shift mask
- Patent Title (中): 集光装置,集光装置和相移掩模的制造方法
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Application No.: US11423989Application Date: 2006-06-14
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Publication No.: US07768711B2Publication Date: 2010-08-03
- Inventor: Motonori Ishii , Kazutoshi Onozawa , Toshinobu Matsuno , Takanori Yogo , Kimiaki Toshikiyo
- Applicant: Motonori Ishii , Kazutoshi Onozawa , Toshinobu Matsuno , Takanori Yogo , Kimiaki Toshikiyo
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JP2005/178586 20050617
- Main IPC: G02B3/00
- IPC: G02B3/00

Abstract:
The present invention provides a method of manufacturing a lens, in which the method includes exposing a photoresist to light using a phase shift mask. Here, the phase shift mask includes layout portions respectively corresponding to pixels and lens, in which each of the layout portions has: a light-blocking portion which has a shape of a substantially circle or a substantially concentric zone; a light-transmitting portion which has a shape of a substantially circle or a substantially concentric zone; a phase shift portion which has a shape of a substantially circle or a substantially concentric zone; and a light-blocking frame. Furthermore, the light-transmitting portion, the light-blocking portion and the phase shift portion are arranged alternately so as to form concentric circles, and the light-blocking frame corresponds to a whole or a part of a perimeter of the lens.
Public/Granted literature
- US20060285228A1 MANUFACTURING METHOD OF LIGHT-COLLECTING DEVICE, LIGHT-COLLECTING DEVICE AND PHASE SHIFT MASK Public/Granted day:2006-12-21
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