Invention Grant
- Patent Title: Optical assembly, projection exposure apparatus and projection objective
- Patent Title (中): 光学组件,投影曝光装置和投影物镜
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Application No.: US12143322Application Date: 2008-06-20
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Publication No.: US07768721B2Publication Date: 2010-08-03
- Inventor: Jochen Weber , Erich Merz , Ole Fluegge , Kai-Uwe Berroth , Cornelia Buehler , Markus Hauf
- Applicant: Jochen Weber , Erich Merz , Ole Fluegge , Kai-Uwe Berroth , Cornelia Buehler , Markus Hauf
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT AG
- Current Assignee: Carl Zeiss SMT AG
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102007029329 20070622
- Main IPC: G02B7/02
- IPC: G02B7/02

Abstract:
In some embodiments, the disclosure relates to an optical assembly that includes an optical element and a structure element. A gap runs between the optical element and the structure element. A sealing element may be present to seal the gap. At least one liquid layer may be arranged between the structure element and/or the optical element, and the sealing element so that a relative displacement of the sealing element with respect to the structure element and/or the optical element is possible in the direction of the layer plane.
Public/Granted literature
- US20080316621A1 OPTICAL ASSEMBLY, PROJECTION EXPOSURE APPARATUS AND PROJECTION OBJECTIVE Public/Granted day:2008-12-25
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B7/00 | 光学元件的安装、调整装置或不漏光连接 |
G02B7/02 | .用于透镜 |