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US07768765B2 Substrate support having heat transfer system 有权
具有传热系统的基板支架

Substrate support having heat transfer system
Abstract:
A support for a substrate processing chamber comprises a fluid circulating reservoir comprising a channel having serpentine convolutions. A fluid inlet supplies a heat transfer fluid to the fluid circulating reservoir and a fluid outlet discharges the heat transfer fluid. In one version, the channel is doubled over to turn back upon itself.
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