Invention Grant
US07768825B2 Gated diode nonvolatile memory structure with diffusion barrier structure
有权
门极二极管非易失性存储器结构具有扩散阻挡结构
- Patent Title: Gated diode nonvolatile memory structure with diffusion barrier structure
- Patent Title (中): 门极二极管非易失性存储器结构具有扩散阻挡结构
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Application No.: US11619108Application Date: 2007-01-02
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Publication No.: US07768825B2Publication Date: 2010-08-03
- Inventor: Hsuan Ling Kao , Wen Jer Tsai , Tien Fan Ou
- Applicant: Hsuan Ling Kao , Wen Jer Tsai , Tien Fan Ou
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld LLP
- Agent Kenta Suzue
- Main IPC: G11C11/36
- IPC: G11C11/36

Abstract:
A gated diode nonvolatile memory cell with a charge storage structure includes a diode structure with an additional gate terminal and a diffusion barrier structure between the diode nodes. Example embodiments include the individual memory cell, an array of such memory cells, methods of operating the memory cell or array of memory cells, and methods of manufacturing the same.
Public/Granted literature
- US20080117672A1 Gated Diode Nonvolatile Memory Structure with Diffusion Barrier Structure Public/Granted day:2008-05-22
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