Invention Grant
- Patent Title: Laser diode and method for fabricating same
- Patent Title (中): 激光二极管及其制造方法
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Application No.: US11600604Application Date: 2006-11-15
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Publication No.: US07769066B2Publication Date: 2010-08-03
- Inventor: Arpan Chakraborty , Monica Hansen , Steven Denbaars , Shuji Nakamura , George Brandes
- Applicant: Arpan Chakraborty , Monica Hansen , Steven Denbaars , Shuji Nakamura , George Brandes
- Applicant Address: US CA Goleta
- Assignee: Cree, Inc.
- Current Assignee: Cree, Inc.
- Current Assignee Address: US CA Goleta
- Agency: Koppel, Patrick, Heybl & Dawson
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
A laser diode and method for fabricating same, wherein the laser diode generally comprises an InGaN compliance layer on a GaN n-type contact layer and an AlGaN/GaN n-type strained super lattice (SLS) on the compliance layer. An n-type GaN separate confinement heterostructure (SCH) is on said n-type SLS and an InGaN multiple quantum well (MQW) active region is on the n-type SCH. A GaN p-type SCH on the MQW active region, an AlGaN/GaN p-type SLS is on the p-type SCH, and a p-type GaN contact layer is on the p-type SLS. The compliance layer has an In percentage that reduces strain between the n-type contact layer and the n-type SLS compared to a laser diode without the compliance layer. Accordingly, the n-type SLS can be grown with an increased Al percentage to increase the index of refraction. This along with other features allows for reduced threshold current and voltage operation.
Public/Granted literature
- US20080112452A1 Laser diode and method for fabricating same Public/Granted day:2008-05-15
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