Invention Grant
- Patent Title: Silica sol gel micro-laser on a substrate
- Patent Title (中): 硅胶溶胶凝胶微激光在基片上
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Application No.: US10985593Application Date: 2004-11-09
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Publication No.: US07769071B2Publication Date: 2010-08-03
- Inventor: Kerry J. Vahala , Lan Yang
- Applicant: Kerry J. Vahala , Lan Yang
- Applicant Address: US CA Pasadena
- Assignee: California Institute of Technology
- Current Assignee: California Institute of Technology
- Current Assignee Address: US CA Pasadena
- Agency: Connolly Bove Lodge & Hutz LLP
- Main IPC: H01S3/08
- IPC: H01S3/08

Abstract:
Silica sol gel micro-lasers and methods of fabricating micro-lasers on a chip or a wafer. A silica sol gel micro-laser includes a silica sol gel optical micro-cavity, a substrate, and a support member or pillar that extends between the micro-cavity and the substrate. An outer surface or periphery of the micro-cavity extends beyond a top of the sol gel support member or is overhanging with respect to the underlying support member. Optical energy travels along an inner surface of the silica sol gel micro-cavity. Undoped silica sol gel micro-cavities can be used for Raman lasers. Sol gel micro-cavities can be doped with, for example, erbium, and can be used for erbium-doped micro-lasers that have ultra narrow line widths, for example, less than 100 Hz. Undoped and doped silica sol gel micro-lasers can have Q factors greater than 107.
Public/Granted literature
- US20050169331A1 Silica sol gel micro-laser on a substrate and method of fabrication Public/Granted day:2005-08-04
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