Invention Grant
- Patent Title: Pattern inspection method and apparatus
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Application No.: US11334476Application Date: 2006-01-19
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Publication No.: US07769226B2Publication Date: 2010-08-03
- Inventor: Teppei Oguni , Tatsuji Nishijima , Akiharu Miyanaga
- Applicant: Teppei Oguni , Tatsuji Nishijima , Akiharu Miyanaga
- Applicant Address: JP Kanagawa-Ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-Ken
- Agency: Nixon Peabody LLP
- Agent Jeffrey L. Costellia
- Priority: JP2005-018004 20050126
- Main IPC: G06K9/00
- IPC: G06K9/00 ; H04N7/18

Abstract:
A color image of an inspection object is taken by an imaging means capable of taking a color image to obtain color information of an RGB color space. A gray-scale image of a color component of the RGB color space or another color space is generated, and the inspection object is detected by a pattern recognition technique. Alternatively, a binary image is generated from the generated gray-scale image, and the inspection object is detected by performing pattern recognition on the binary image. Color data of a pixel occupied by the detected inspection object is compared with color data of a non-defective inspection object which is previously prepared to judge whether or not the inspection object is defective. In addition, this judgment result is reflected in another manufacturing step through a network and product quality is improved.
Public/Granted literature
- US20060210142A1 Pattern inspection method and apparatus Public/Granted day:2006-09-21
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