Invention Grant
- Patent Title: Stress analysis method and stress analysis apparatus
- Patent Title (中): 应力分析法和应力分析仪
-
Application No.: US11883919Application Date: 2006-01-11
-
Publication No.: US07769550B2Publication Date: 2010-08-03
- Inventor: Koji Hyodo , Chao-Nan Xu
- Applicant: Koji Hyodo , Chao-Nan Xu
- Applicant Address: JP Tokyo
- Assignee: National Institute of Advanced Industrial Science and Technology
- Current Assignee: National Institute of Advanced Industrial Science and Technology
- Current Assignee Address: JP Tokyo
- Agency: Rader, Fishman & Grauer PLLC
- Priority: JP2005-033124 20050209
- International Application: PCT/JP2006/000176 WO 20060111
- International Announcement: WO2006/085424 WO 20060817
- Main IPC: G01L1/00
- IPC: G01L1/00 ; G01L5/00

Abstract:
A stress analysis method uses a thermoelastic stress measurement device to measure measuring stress state acting on an object by measuring material temperature state variation caused by stress, a mechanoluminescence measurement device to measure measuring stress state acting on the object by measuring light emitted from mechanoluminescence material according to the stress and an arithmetic processing device to obtain mechanical information, which includes prescribed stress distribution, by performing arithmetic processing on both the measurement data.
Public/Granted literature
- US20080120045A1 Stress Analysis Method and Stress Analysis Apparatus Public/Granted day:2008-05-22
Information query