Invention Grant
- Patent Title: Scanning probe microscope system
- Patent Title (中): 扫描探针显微镜系统
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Application No.: US11887276Application Date: 2006-03-16
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Publication No.: US07770232B2Publication Date: 2010-08-03
- Inventor: Akira Saito , Masakazu Aono , Yuji Kuwahara , Jyunpei Maruyama , Ken Manabe
- Applicant: Akira Saito , Masakazu Aono , Yuji Kuwahara , Jyunpei Maruyama , Ken Manabe
- Applicant Address: JP Wako
- Assignee: Riken
- Current Assignee: Riken
- Current Assignee Address: JP Wako
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2005-090396 20050328
- International Application: PCT/JP2006/305203 WO 20060316
- International Announcement: WO2006/103937 WO 20061005
- Main IPC: G01Q30/02
- IPC: G01Q30/02

Abstract:
A scanning probe microscope system capable of identifying an element with atomic scale spatial resolution comprises: an X-ray irradiation means for irradiating a measurement object with high-brilliance monochromatic X-rays having a beam diameter smaller than 1 mm; a probe arranged to oppose to the measurement object; a processing means for detecting and processing a tunneling current through the probe; and a scanning probe microscope having an alignment means for relatively moving the measurement object, the probe, and the incident position of the high-brilliance monochromatic X-rays to the measurement object.
Public/Granted literature
- US20080258059A1 Scanning Probe Microscope System Public/Granted day:2008-10-23
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