发明授权
- 专利标题： Hydrogen atom generation source in vacuum treatment apparatus, and hydrogen atom transportation method
- 专利标题（中）： 真空处理装置中的氢原子产生源，氢原子输运法
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申请号： US11816726申请日： 2005-07-15
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公开(公告)号： US07771701B2公开(公告)日： 2010-08-10
- 发明人: Hironobu Umemoto , Atsushi Masuda , Koji Yoneyama , Keiji Ishibashi , Manabu Ikemoto
- 申请人： Hironobu Umemoto , Atsushi Masuda , Koji Yoneyama , Keiji Ishibashi , Manabu Ikemoto
- 申请人地址： JP Kawasaki-Shi, Kanagawa
- 专利权人： Canon Anelva Corporation
- 当前专利权人： Canon Anelva Corporation
- 当前专利权人地址： JP Kawasaki-Shi, Kanagawa
- 代理机构： Buchanan Ingersoll & Rooney PC
- 优先权： JP2005-044413 20050221
- 国际申请： PCT/JP2005/013175 WO 20050715
- 国际公布： WO2006/087833 WO 20060824
- 主分类号： C01B3/02
- IPC分类号： C01B3/02 ; B01J19/02 ; B05D7/22 ; C23C16/22
摘要：
In a hydrogen atom generation source in a vacuum treatment apparatus which can effectively inhibit hydrogen atoms from being recombined due to contact with an internal wall surface of a treatment chamber of the vacuum treatment apparatus and an internal wall surface of a transport passage, and being returned into hydrogen molecules, at least a part of a surface facing a space with the hydrogen atom generation source formed therein of a member surrounding the hydrogen atom generation source is coated with SiO2. In a hydrogen atom transportation method for transporting hydrogen atoms generated by the hydrogen atom generation source in the vacuum treatment apparatus to a desired place, the hydrogen atoms are transported via a transport passage whose internal wall surface is coated with SiO2.