发明授权
US07771903B2 Photolithography with optical masks having more transparent features surrounded by less transparent features
有权
具有光学掩模的光刻具有更透明的特征，由较不透明的特征包围
- 专利标题： Photolithography with optical masks having more transparent features surrounded by less transparent features
- 专利标题（中）： 具有光学掩模的光刻具有更透明的特征，由较不透明的特征包围
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申请号： US12128456申请日： 2008-05-28
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公开(公告)号： US07771903B2公开(公告)日： 2010-08-10
- 发明人: Fenghong Zhang , Xinyu Zhang , Jian Xu
- 申请人： Fenghong Zhang , Xinyu Zhang , Jian Xu
- 申请人地址： SG Singapore
- 专利权人： Promos Technologies Pte. Ltd.
- 当前专利权人： Promos Technologies Pte. Ltd.
- 当前专利权人地址： SG Singapore
- 代理机构： Haynes and Boone, LLP
- 代理商 Michael Shenker
- 主分类号： G03F1/00
- IPC分类号： G03F1/00 ; G03C5/00
摘要：
In photolithographic exposure, a feature (144) of an optical mask is projected onto a dark area (160). The light intensity inside the dark area is reduced by providing a non-printable clear cutout (410) inside the feature. The optical mask has the same optical pathlength outside the feature (144) adjacent to the entire outer boundary of the feature as at the cutout, the optical pathlength being measured along the optical mask's thickness.
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