发明授权
- 专利标题： Superconducting film and method of manufacturing the same
- 专利标题（中）： 超导薄膜及其制造方法
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申请号： US10569801申请日： 2004-08-27
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公开(公告)号： US07772157B2公开(公告)日： 2010-08-10
- 发明人: Kaname Matsumoto , Masashi Mukaida , Yutaka Yoshida , Ataru Ichinose , Shigeru Horii
- 申请人： Kaname Matsumoto , Masashi Mukaida , Yutaka Yoshida , Ataru Ichinose , Shigeru Horii
- 申请人地址： JP Saitama JP Tokyo
- 专利权人： Japan Science and Technology Agency,Central Research Institute of Electric Power Industry
- 当前专利权人： Japan Science and Technology Agency,Central Research Institute of Electric Power Industry
- 当前专利权人地址： JP Saitama JP Tokyo
- 代理机构： Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- 优先权： JP2003-308020 20030829
- 国际申请： PCT/JP2004/012781 WO 20040827
- 国际公布： WO2005/022562 WO 20050310
- 主分类号： H01L39/24
- IPC分类号： H01L39/24
摘要：
The present invention relates to a superconducting film having a substrate and a superconductor layer formed on the substrate, in which nano grooves are formed parallel to a current flowing direction on a substrate surface on which the superconductor layer is formed and two-dimensional crystal defects are introduced in the superconductor layer on the nano grooves, and a method of manufacturing this superconducting film. A superconducting film of the invention, which is obtained at low cost and has very high Jc, is useful in applications such as cables, magnets, shields, current limiters, microwave devices, and semifinished products of these articles.
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