Invention Grant
- Patent Title: Color metric for halo artifacts
- Patent Title (中): 光晕伪像的色彩度量
-
Application No.: US11591662Application Date: 2006-10-30
-
Publication No.: US07773257B2Publication Date: 2010-08-10
- Inventor: Florian Ciurea , Alexander Berestov , Tatsuya Deguchi , Naoya Katoh
- Applicant: Florian Ciurea , Alexander Berestov , Tatsuya Deguchi , Naoya Katoh
- Applicant Address: JP Tokyo US NJ Park Ridge
- Assignee: Sony Corporation,Sony Electronics Inc.
- Current Assignee: Sony Corporation,Sony Electronics Inc.
- Current Assignee Address: JP Tokyo US NJ Park Ridge
- Agency: Haverstock & Owens LLP
- Main IPC: G06F15/00
- IPC: G06F15/00

Abstract:
A method of evaluating halo artifacts is described herein. The method utilizes a pattern of color patches, a color space and color difference metrics to analyze color changes which correlate to the amount of halo. The pattern of color patches is utilized in the CIE L*a*b* color space to determine an area of patch unaffected by halo of the pattern of color patches. After the area of patch unaffected by halo is determined, a Reference Value is computed by averaging the CIE L*a*b* color for the area of patch unaffected by halo. Then an Artifact Value is calculated either by averaging the CIE L*a*b* color for the area outside the area of patch unaffected by halo but before the margin or by averaging the CIE L*a*b* color on the edge of the patch. Once these values are determined, the halo quantity is calculated.
Public/Granted literature
- US20080144056A1 Color metric for halo artifacts Public/Granted day:2008-06-19
Information query