发明授权
- 专利标题: Color metric for halo artifacts
- 专利标题(中): 光晕伪像的色彩度量
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申请号: US11591662申请日: 2006-10-30
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公开(公告)号: US07773257B2公开(公告)日: 2010-08-10
- 发明人: Florian Ciurea , Alexander Berestov , Tatsuya Deguchi , Naoya Katoh
- 申请人: Florian Ciurea , Alexander Berestov , Tatsuya Deguchi , Naoya Katoh
- 申请人地址: JP Tokyo US NJ Park Ridge
- 专利权人: Sony Corporation,Sony Electronics Inc.
- 当前专利权人: Sony Corporation,Sony Electronics Inc.
- 当前专利权人地址: JP Tokyo US NJ Park Ridge
- 代理机构: Haverstock & Owens LLP
- 主分类号: G06F15/00
- IPC分类号: G06F15/00
摘要:
A method of evaluating halo artifacts is described herein. The method utilizes a pattern of color patches, a color space and color difference metrics to analyze color changes which correlate to the amount of halo. The pattern of color patches is utilized in the CIE L*a*b* color space to determine an area of patch unaffected by halo of the pattern of color patches. After the area of patch unaffected by halo is determined, a Reference Value is computed by averaging the CIE L*a*b* color for the area of patch unaffected by halo. Then an Artifact Value is calculated either by averaging the CIE L*a*b* color for the area outside the area of patch unaffected by halo but before the margin or by averaging the CIE L*a*b* color on the edge of the patch. Once these values are determined, the halo quantity is calculated.
公开/授权文献
- US20080144056A1 Color metric for halo artifacts 公开/授权日:2008-06-19
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