发明授权
US07776730B2 Siloxane polymer composition, method of forming a pattern using the same, and method of manufacturing a semiconductor using the same
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硅氧烷聚合物组合物，使用其形成图案的方法，以及使用其制造半导体的方法
- 专利标题： Siloxane polymer composition, method of forming a pattern using the same, and method of manufacturing a semiconductor using the same
- 专利标题（中）： 硅氧烷聚合物组合物，使用其形成图案的方法，以及使用其制造半导体的方法
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申请号： US12216682申请日： 2008-07-09
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公开(公告)号： US07776730B2公开(公告)日： 2010-08-17
- 发明人: Kyoung-Mi Kim , Young-Ho Kim , Youn-Kyung Wang , Mi-Ra Park
- 申请人： Kyoung-Mi Kim , Young-Ho Kim , Youn-Kyung Wang , Mi-Ra Park
- 申请人地址： KR Suwon-si, Gyeonggi-do
- 专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人地址： KR Suwon-si, Gyeonggi-do
- 代理机构： Lee & Morse, P.C.
- 优先权： KR10-2007-0068625 20070709
- 主分类号： H01L21/20
- IPC分类号： H01L21/20 ; H01L21/3205 ; H01L21/4763
摘要：
A siloxane polymer composition includes an organic solvent in an amount of about 93 percent by weight to about 98 percent by weight, based on a total weight of the siloxane polymer composition, and a siloxane complex in an amount of about 2 percent by weight to about 7 percent by weight, based on the total weight of the siloxane polymer composition, the siloxane complex including a siloxane polymer with an introduced carboxylic acid and being represented by Formula 1 below, wherein each of R1, R2 R3, and R4 independently represents H, OH, CH3, C2H5, C3H7, C4H9 or C5H11, R′ represents CH2, C2H4, C3H6, C4H8, C5H10 or C6H12, and n represents a positive integer so the siloxane polymer of the siloxane complex has a number average molecular weight of about 4,000 to about 5,000.
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