发明授权
- 专利标题: Metrological characterisation of microelectronic circuits
- 专利标题(中): 微电子电路的计量表征
-
申请号: US11793674申请日: 2005-12-22
-
公开(公告)号: US07777880B2公开(公告)日: 2010-08-17
- 发明人: Antonello De Martino , Bernard Drevillon
- 申请人: Antonello De Martino , Bernard Drevillon
- 申请人地址: FR Palaiseau FR Paris
- 专利权人: Ecole Polytechnique,Centre National de la Recherche Scientifique - CNRS
- 当前专利权人: Ecole Polytechnique,Centre National de la Recherche Scientifique - CNRS
- 当前专利权人地址: FR Palaiseau FR Paris
- 代理机构: Young & Thompson
- 优先权: FR0453231 20041224
- 国际申请: PCT/FR2005/051130 WO 20051222
- 国际公布: WO2006/070161 WO 20060706
- 主分类号: G01J4/00
- IPC分类号: G01J4/00
摘要:
Method and a polarimetric measurement device of a planar object carrying patterns repeated regularly and forming the lines of a grid. A first measurement is carried out at zero order, under an angle of incidence θ1 and for a first azimuthal angle φ1, a second measurement at least is carried out at zero order, under an angle of incidence θ2 and for a second azimuthal angle φ2, the polarization of the incident beam is modulated and the polarization of the reflected beam is analyzed for each measurement, theoretical polarimetric data is calculated for a model object of the real object, the model object including parameters adjustable using a formalism of electromagnetism. An iterative comparison of the measurements is conducted with the theoretical polarimetric data for different values of the adjustable parameters.
公开/授权文献
信息查询