发明授权
- 专利标题: Linear-carrier phase-mask interferometer
- 专利标题(中): 线性载波相位掩模干涉仪
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申请号: US11800840申请日: 2007-05-08
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公开(公告)号: US07777895B2公开(公告)日: 2010-08-17
- 发明人: Brian S. Medower , James E. Millerd
- 申请人: Brian S. Medower , James E. Millerd
- 申请人地址: US AZ Tucson
- 专利权人: 4D Technology Corporation
- 当前专利权人: 4D Technology Corporation
- 当前专利权人地址: US AZ Tucson
- 代理商 Antonio R. Durando
- 主分类号: G01B11/02
- IPC分类号: G01B11/02
摘要:
A phase-difference sensor measures the spatially resolved difference in phase between orthogonally polarized reference and test wavefronts. The sensor is constructed as a linear-carrier phase-mask aligned to and imaged on a linear-carrier detector array. Each adjacent element of the phase-mask measures a predetermined relative phase shift between the orthogonally polarized reference and test beams. Thus, multiple phase-shifted interferograms can be synthesized at the same time by combining pixels with identical phase-shifts. The multiple phase-shifted interferograms can be combined to calculate standard parameters such as modulation index or average phase step. Any configuration of interferometer that produces orthogonally polarized reference and object beams may be combined with the phase-difference sensor of the invention to provide single-shot, simultaneous phase-shifting measurements.
公开/授权文献
- US20070211256A1 Linear-carrier phase-mask interferometer 公开/授权日:2007-09-13
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