发明授权
US07780866B2 Method of plasma confinement for enhancing magnetic control of plasma radial distribution
有权
用于增强等离子体径向分布磁控制的等离子体限制方法
- 专利标题: Method of plasma confinement for enhancing magnetic control of plasma radial distribution
- 专利标题(中): 用于增强等离子体径向分布磁控制的等离子体限制方法
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申请号: US11751592申请日: 2007-05-21
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公开(公告)号: US07780866B2公开(公告)日: 2010-08-24
- 发明人: Matthew L. Miller , Daniel J. Hoffman , Steven C. Shannon , Michael Kutney , James Carducci , Andrew Nguyen
- 申请人: Matthew L. Miller , Daniel J. Hoffman , Steven C. Shannon , Michael Kutney , James Carducci , Andrew Nguyen
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Law Office of Robert M. Wallace
- 主分类号: B44C1/22
- IPC分类号: B44C1/22 ; C03C15/00 ; C03C25/68 ; C23F1/00
摘要:
A method for processing a workpiece in a plasma reactor. The method comprises constraining plasma in the chamber away from the floor of the pumping annulus, providing an annular baffle while compensating for asymmetry of gas flow attributable to the pumping port, and providing a gas flow equalizer below the baffle having an eccentrically shaped opening. The method further includes modifying the radial distribution of plasma ion density and providing a magnetic plasma steering field having an edge high plasma ion density distribution tendency. The method further comprises locating the baffle at a sufficient distance below the workpiece to provide an edge low plasma ion density distribution tendency that compensates the edge high plasma ion density distribution tendency of the magnetic plasma steering field.
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