发明授权
- 专利标题: Manufacturing method of pattern formed body, and photomask for vacuum-ultraviolet light
- 专利标题(中): 图案成型体的制造方法,真空紫外线光掩模
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申请号: US11523813申请日: 2006-09-15
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公开(公告)号: US07781127B2公开(公告)日: 2010-08-24
- 发明人: Takashi Sawada , Masafumi Kamada , Kaori Yamashita , Hironori Kobayashi
- 申请人: Takashi Sawada , Masafumi Kamada , Kaori Yamashita , Hironori Kobayashi
- 申请人地址: JP Tokyo-to
- 专利权人: Dai Nippon Printing Co., Ltd.
- 当前专利权人: Dai Nippon Printing Co., Ltd.
- 当前专利权人地址: JP Tokyo-to
- 代理机构: Ladas & Parry LLP
- 优先权: JP2005-269708 20050916
- 主分类号: G03F1/00
- IPC分类号: G03F1/00
摘要:
A main object of the present invention is to provide a manufacturing method of a pattern formed body which makes it possible to form property varied patterns having a desired line width, even when plural pattern formed bodies are manufactured. To achieve the object, the invention provides a manufacturing method of pattern formed bodies, comprising: a pattern-forming step of radiating vacuum-ultraviolet light onto a patterning substrate, a surface property of which is varied by the vacuum-ultraviolet light, through a photomask having at least a transparent substrate and a light shielding part to form a pattern formed body having a property varied pattern, in which the surface property of the patterning substrate is varied; and a step of repeating the pattern-forming step to manufacture a plurality of the pattern formed bodies, wherein an interval between the transparent substrate and the patterning substrate upon the pattern-forming step is set into the range of 0.1 μm to 200 μm.
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