发明授权
- 专利标题: Electrical contact with overlapping structure
- 专利标题(中): 电接触重叠结构
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申请号: US12485066申请日: 2009-06-16
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公开(公告)号: US07789671B2公开(公告)日: 2010-09-07
- 发明人: Wen-Yi Hsieh , Shih-Wei Hsiao
- 申请人: Wen-Yi Hsieh , Shih-Wei Hsiao
- 申请人地址: TW Taipei Hsien
- 专利权人: Hon Hai Precision Ind. Co., Ltd.
- 当前专利权人: Hon Hai Precision Ind. Co., Ltd.
- 当前专利权人地址: TW Taipei Hsien
- 代理商 Andrew C. Cheng; Wei Te Chung; Ming Chieh Chang
- 优先权: TW97210594U 20080616
- 主分类号: H01R12/00
- IPC分类号: H01R12/00
摘要:
An electrical contact includes a first contact pin, a second contact pin and an elastic member surrounding the first contact pin and the second contact pin. Both of the first contact pin and the second contact pin include contacting portions. The first contact pin has a guiding portion including two lead-in arms and a stop portion between the two leading arms. The second contact has a main body and a protrusion on a top end of the main body. The leading arms define a guiding groove therebetween for the main body of the second contact pin moving up and down. The protrusion abuts against the stop portion of the first contact pin to prevent the second contact from sliding out of the guiding groove.
公开/授权文献
- US20090311886A1 ELECTRICAL CONTACT WITH OVERLAPPING STRUCTURE 公开/授权日:2009-12-17
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