发明授权
- 专利标题： Condensation type polymer-containing anti-reflective coating for semiconductor
- 专利标题（中）： 用于半导体的冷凝型聚合物抗反射涂层
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申请号： US11547001申请日： 2005-04-06
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公开(公告)号： US07790356B2公开(公告)日： 2010-09-07
- 发明人: Takahiro Kishioka , Rikimaru Sakamoto , Yoshiomi Hiroi , Daisuke Maruyama
- 申请人： Takahiro Kishioka , Rikimaru Sakamoto , Yoshiomi Hiroi , Daisuke Maruyama
- 申请人地址： JP Tokyo
- 专利权人： Nissan Chemical Industries, Ltd.
- 当前专利权人： Nissan Chemical Industries, Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff & Berridge, PLC
- 优先权： JP2004-115385 20040409
- 国际申请： PCT/JP2005/006785 WO 20050406
- 国际公布： WO2005/098542 WO 20051020
- 主分类号： G03F7/11
- IPC分类号： G03F7/11 ; C08L79/04 ; C09D163/00 ; C09D179/04 ; H01L21/027
摘要：
There is provided an anti-reflective coating forming composition comprising a polymer having a pyrimidinetrione structure, imidazolidinedione structure, imidazolidinetrione structure or triazinetrione structure and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, and can use in lithography process by use of a light having a short wavelength such as ArF excimer laser beam (wavelength 193 nm) or F2 excimer laser beam (wavelength 157 nm), etc.