发明授权
- 专利标题： Pattern formation method, electronic circuit manufactured by the same, and electronic device using the same
- 专利标题（中）： 图案形成方法，由其制造的电子电路和使用其的电子装置
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申请号： US11431504申请日： 2006-05-11
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公开(公告)号： US07790358B2公开(公告)日： 2010-09-07
- 发明人: Ryohei Satoh , Yoshinori Iwata , Koji Nakagawa , Reo Usui
- 申请人： Ryohei Satoh , Yoshinori Iwata , Koji Nakagawa , Reo Usui
- 申请人地址： JP Tokyo
- 专利权人： Asahi Glass Company, Limited
- 当前专利权人： Asahi Glass Company, Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2003-381662 20031111; JP2004-195306 20040701
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
There is provided a method for forming a continuous thin film circuit pattern with good precision, at low cost and with low environmental burden; an electronic circuit fabricated by the same, and an electronic device including the same.There are a step for forming a mask layer 2 on a substrate 1; a step for forming an opening pattern in the mask layer 2; a step for forming a thin film 3 on the substrate 1 and on the mask layer 2; and a step for removing, from the substrate 1, the mask layer 2 and a portion of the thin film 3 formed on the mask layer 2; wherein the opening pattern is formed under a dry condition.
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