发明授权
- 专利标题: Thin film transistor
- 专利标题(中): 薄膜晶体管
-
申请号: US11734390申请日: 2007-04-12
-
公开(公告)号: US07791073B2公开(公告)日: 2010-09-07
- 发明人: Hidetada Tokioka , Naoki Nakagawa , Masafumi Agari
- 申请人: Hidetada Tokioka , Naoki Nakagawa , Masafumi Agari
- 申请人地址: JP Tokyo
- 专利权人: Mitsubishi Electric Corporation
- 当前专利权人: Mitsubishi Electric Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2006-114014 20060418
- 主分类号: H01L31/20
- IPC分类号: H01L31/20
摘要:
In first and second gate electrodes constituting a gate electrode, the gate length of the second gate electrode is set shorter than the gate length of the first gate electrode and short enough to produce the short channel effect. The threshold voltage of a second transistor corresponding to the second gate electrode can thereby be made lower than the threshold voltage of a first transistor corresponding to the first gate electrode. When the same voltage is applied to the first and second gate electrodes, an electric field concentration at the channel edge on the drain side is reduced. This in result reduces the channel length modulation effect.
公开/授权文献
- US20070241336A1 THIN FILM TRANSISTOR 公开/授权日:2007-10-18
信息查询
IPC分类: