发明授权
US07791725B2 Method and equipment for detecting pattern defect 有权
检测图案缺陷的方法和设备

Method and equipment for detecting pattern defect
摘要:
An inspection apparatus and method includes a light source which emits an ultraviolet laser beam, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.
公开/授权文献
信息查询
0/0