发明授权
- 专利标题: Method and equipment for detecting pattern defect
- 专利标题(中): 检测图案缺陷的方法和设备
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申请号: US12271348申请日: 2008-11-14
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公开(公告)号: US07791725B2公开(公告)日: 2010-09-07
- 发明人: Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
- 申请人: Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP10-372769 19981228; JP11-262997 19990917
- 主分类号: G01J4/00
- IPC分类号: G01J4/00
摘要:
An inspection apparatus and method includes a light source which emits an ultraviolet laser beam, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.
公开/授权文献
- US20090073443A1 Method And Equipment For Detecting Pattern Defect 公开/授权日:2009-03-19
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