发明授权
- 专利标题： Chemically amplified positive resist composition
- 专利标题（中）： 化学放大正光刻胶组合物
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申请号： US12121458申请日： 2008-05-15
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公开(公告)号： US07794913B2公开(公告)日： 2010-09-14
- 发明人: Makoto Akita , Masumi Suetsugu , Kazuhiko Hashimoto
- 申请人： Makoto Akita , Masumi Suetsugu , Kazuhiko Hashimoto
- 申请人地址： JP Tokyo
- 专利权人： Sumitomo Chemical Company, Limited
- 当前专利权人： Sumitomo Chemical Company, Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： JP2007-132614 20070518
- 主分类号： G03F7/004
- IPC分类号： G03F7/004
摘要：
A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): (ii) a polymerization unit represented by the formula (II): and (iii) at least one polymerization unit selected from the group consisting of a polymerization unit represented by the formula (III): and a polymerization unit represented by the formula (IV): and (B) at least one acid generator.
公开/授权文献
- US20080286691A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 公开/授权日：2008-11-20
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