发明授权
- 专利标题: Dual-side imprinting lithography system
- 专利标题(中): 双面压印光刻系统
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申请号: US12035702申请日: 2008-02-22
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公开(公告)号: US07798802B2公开(公告)日: 2010-09-21
- 发明人: Eun-hyoung Cho , Sung-hoon Choa , Jin-seung Sohn , Du-hyun Lee
- 申请人: Eun-hyoung Cho , Sung-hoon Choa , Jin-seung Sohn , Du-hyun Lee
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si
- 代理机构: Sughrue Mion, PLLC
- 优先权: KR10-2007-0087311 20070829
- 主分类号: B29C59/00
- IPC分类号: B29C59/00 ; B29B13/08
摘要:
Provided is a dual-side imprinting lithography system that includes a medium supporting unit that supports a medium wherein both surfaces of the medium are coated with a ultraviolet (UV) hardening resin; a first mold supporting unit and a second mold supporting unit that respectively support a first mold and a second mold, disposed respectively above the medium supporting unit and under the medium supporting unit; a vertical moving device that moves vertically at least one of the medium supporting unit, the first mold supporting unit, and the second mold supporting unit; a first UV radiating device that is installed above the first mold supporting unit to radiate UV rays; and a second UV radiating device that is installed under the second mold supporting unit to radiate UV rays.
公开/授权文献
- US20090061035A1 DUAL-SIDE IMPRINTING LITHOGRAPHY SYSTEM 公开/授权日:2009-03-05