发明授权
- 专利标题: Method of forming nanocrystals
- 专利标题(中): 形成纳米晶体的方法
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申请号: US12339262申请日: 2008-12-19
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公开(公告)号: US07799634B2公开(公告)日: 2010-09-21
- 发明人: Jinmiao J. Shen , Horacio P. Gasquet , Sung-Taeg Kang , Marc A. Rossow
- 申请人: Jinmiao J. Shen , Horacio P. Gasquet , Sung-Taeg Kang , Marc A. Rossow
- 申请人地址: US TX Austin
- 专利权人: Freescale Semiconductor, Inc.
- 当前专利权人: Freescale Semiconductor, Inc.
- 当前专利权人地址: US TX Austin
- 代理商 Daniel D. Hill; James L. Clingan, Jr.
- 主分类号: H01L21/336
- IPC分类号: H01L21/336
摘要:
Nanocrystals are formed over an insulating layer by depositing a semiconductor layer over the insulating layer. The semiconductor layer is annealed to form a plurality of globules from the semiconductor layer. The globules are annealed using oxygen. Semiconductor material is deposited on the plurality of globules to add semiconductor material to the globules. After depositing the semiconductor material, the globules are annealed to form the nanocrystals. The nanocrystals can then be used in a storage layer of a non-volatile memory cell, especially a split-gate non-volatile memory cell having a select gate over the nanocrystals and a control gate adjacent to the select gate.
公开/授权文献
- US20100159651A1 METHOD OF FORMING NANOCRYSTALS 公开/授权日:2010-06-24
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