In a conventional solid state imaging device, there is a room for improvement in sensitivity. In order to solve the problem, a solid state imaging device includes a semiconductor substrate and a light receiving portion. The light receiving portion is provided adjacent to a surface layer on the surface (a first surface) side of the semiconductor substrate. The surface of the light receiving portion is silicided. The solid state imaging device is one in which light from an object to be imaged incident on the back side (a second surface) of the semiconductor substrate is photoelectric-converted inside the semiconductor substrate, the light receiving portion receives electric charge generated by the photoelectric conversion, and the above mentioned object to be imaged is imaged.