Invention Grant
- Patent Title: Free layer/capping layer for high performance MRAM MTJ
- Patent Title (中): 用于高性能MRAM MTJ的自由层/覆盖层
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Application No.: US12319971Application Date: 2009-01-14
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Publication No.: US07808027B2Publication Date: 2010-10-05
- Inventor: Cheng T. Horng , Ru-Ying Tong
- Applicant: Cheng T. Horng , Ru-Ying Tong
- Applicant Address: US CA Milpitas
- Assignee: MagIC Technologies, Inc.
- Current Assignee: MagIC Technologies, Inc.
- Current Assignee Address: US CA Milpitas
- Agency: Saile Ackerman LLC
- Agent Stephen B. Ackerman
- Main IPC: H01L29/76
- IPC: H01L29/76

Abstract:
An MTJ MRAM cell and its method of formation are described. The cell includes a composite free layer having the general form (Ni88Fe12)1-xCo100x—Ni92Fe8 with x between 0.05 and 0.1 that provides low magnetization and negative magnetostriction. The magnetostriction can be tuned to a low value by a multilayer capping layer that includes a positive magnetostriction layer of NiFeHf(15%). When this cell forms an MRAM array, it contributes to a TMR≧26%, a TMR/Rp—cov≧15.5 and a high AQF (array quality factor) for write operations.
Public/Granted literature
- US20100176470A1 NOVEL FREE LAYER/CAPPING LAYER FOR HIGH PERFORMANCE MRAM MTJ Public/Granted day:2010-07-15
Information query
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