Invention Grant
- Patent Title: Power line layout
- Patent Title (中): 电源线布局
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Application No.: US11979868Application Date: 2007-11-09
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Publication No.: US07808804B2Publication Date: 2010-10-05
- Inventor: Hyuk-joon Kwon
- Applicant: Hyuk-joon Kwon
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2006-0111224 20061110; KR10-2007-0052198 20070529
- Main IPC: G11C5/02
- IPC: G11C5/02

Abstract:
A power line layout for a semiconductor device includes a memory cell region, a plurality of wordline enable signal lines in the memory cell region, a plurality of first power lines arranged between the wordline enable signal lines in the memory cell region, and a plurality of second power lines arranged perpendicular to the first power lines in the memory cell region to form a mesh arrangement of first and second power lines.
Public/Granted literature
- US20080112203A1 Power line layout Public/Granted day:2008-05-15
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