发明授权
- 专利标题： Photoresist composition and method of manufacturing a color filter substrate by using the same
- 专利标题（中）： 光刻胶组合物及其制造方法
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申请号： US12569857申请日： 2009-09-29
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公开(公告)号： US07811726B2公开(公告)日： 2010-10-12
- 发明人: Se-Ah Kwon , Chul Huh , Jin-Seuk Kim , Byoung-Joo Kim
- 申请人： Se-Ah Kwon , Chul Huh , Jin-Seuk Kim , Byoung-Joo Kim
- 申请人地址： KR
- 专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人地址： KR
- 代理机构： Innovation Counsel LLP
- 优先权： KR10-2006-0062860 20060705
- 主分类号： G03F7/004
- IPC分类号： G03F7/004
摘要：
A photoresist composition includes a coloring agent, a binder resin, a cross-linker, a photo-polymerization initiator and a solvent. The coloring agent includes an anthraquinone-based dye and a pigment. A color filter formed from the photoresist composition has a relatively greater light-transmittance. Thus, a contrast of a display apparatus having the color filter may be improved.
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