发明授权
US07815981B2 Gas barrier film, substrate film, and organic electroluminescence device
失效
气体阻隔膜，基底膜和有机电致发光器件
- 专利标题： Gas barrier film, substrate film, and organic electroluminescence device
- 专利标题（中）： 气体阻隔膜，基底膜和有机电致发光器件
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申请号： US11384399申请日： 2006-03-21
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公开(公告)号： US07815981B2公开(公告)日： 2010-10-19
- 发明人: Hiroshi Iwanaga , Seiya Sakurai
- 申请人： Hiroshi Iwanaga , Seiya Sakurai
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： JP2005-082555 20050322
- 主分类号： C09K19/00
- IPC分类号： C09K19/00
摘要：
A gas barrier film comprising a gas barrier laminate on a substrate film, wherein the gas barrier laminate comprises at least one three-layer unit consisting of a silicon nitride layer, a silicon oxynitride layer adjacent to the silicon nitride layer, and a silicon nitride layer adjacent to the silicon oxynitride layer. The gas barrier film has excellent transparency and gas barrier property.