发明授权
US07816480B2 Silole-based polymers and semiconductor materials prepared from the same
有权
基于Silole的聚合物和由其制备的半导体材料
- 专利标题： Silole-based polymers and semiconductor materials prepared from the same
- 专利标题（中）： 基于Silole的聚合物和由其制备的半导体材料
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申请号： US12563680申请日： 2009-09-21
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公开(公告)号： US07816480B2公开(公告)日： 2010-10-19
- 发明人: Tobin J. Marks , Antonio Facchetti , Gang Lu , Hakan Usta , Joseph Letizia
- 申请人： Tobin J. Marks , Antonio Facchetti , Gang Lu , Hakan Usta , Joseph Letizia
- 申请人地址： US IL Evanston
- 专利权人： Northwestern University
- 当前专利权人： Northwestern University
- 当前专利权人地址： US IL Evanston
- 代理机构： K&L Gates LLP
- 主分类号： C08G77/04
- IPC分类号： C08G77/04
摘要：
The present teachings provide silole-based polymers that can be used as p-type semiconductors. More specifically, the present teachings provide polymers that include a repeating unit of Formula I: wherein R1, R2, R3, R4, R5R6, Z, x, and x′ are as defined herein. The present teachings also provide methods of preparing these polymers, and relate to various compositions, composites, and devices that incorporate these polymers.
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