- 专利标题： Method and apparatus for wafer cleaning
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申请号： US11497193申请日： 2006-07-31
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公开(公告)号： US07819985B2公开(公告)日： 2010-10-26
- 发明人: Steven Verhaverbeke , J. Kelly Truman , Alexander Ko , Rick R. Endo
- 申请人： Steven Verhaverbeke , J. Kelly Truman , Alexander Ko , Rick R. Endo
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Blakely Sokoloff Taylor & Zafman
- 主分类号： B08B7/00
- IPC分类号： B08B7/00 ; B08B3/00 ; B08B7/04
摘要：
An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer.
公开/授权文献
- US20060278253A1 Method and apparatus for wafer cleaning 公开/授权日：2006-12-14
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