发明授权
US07820078B2 Layer configuration with improved stability to sunlight exposure 有权
层状结构具有改善的阳光照射的稳定性

  • 专利标题: Layer configuration with improved stability to sunlight exposure
  • 专利标题(中): 层状结构具有改善的阳光照射的稳定性
  • 申请号: US12107898
    申请日: 2008-04-23
  • 公开(公告)号: US07820078B2
    公开(公告)日: 2010-10-26
  • 发明人: Frank Louwet
  • 申请人: Frank Louwet
  • 申请人地址: BE Mortsel
  • 专利权人: Agfa Graphics, N.V.
  • 当前专利权人: Agfa Graphics, N.V.
  • 当前专利权人地址: BE Mortsel
  • 代理机构: Leydig, Voit & Mayer, Ltd.
  • 主分类号: H01B1/20
  • IPC分类号: H01B1/20
Layer configuration with improved stability to sunlight exposure
摘要:
Disclosed are a light-emitting diode, a photovoltaic device, a transistor, and an electroluminescent device, each comprising a layer disposed on a support, the layer comprising a [A] composition exclusive of hydroquinone comprising at least one polymer comprising (3,4-dialkoxythiophene) monomer units, a polyanion, at least one polyhydroxy group-containing aromatic compound exclusive of sulfo groups, at least one amino-compound or heterocyclic compound with at least one ring nitrogen atom, and at least one compound selected from the group consisting of polyhydroxy- and/or carboxy group or amide or lactam group containing aliphatic compounds and aprotic compounds with a dielectric constant ≧15.
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