发明授权
US07820486B2 Method of fabricating a semiconductor device having a heat sink with an exposed surface
有权
制造具有具有暴露表面的散热器的半导体器件的方法
- 专利标题: Method of fabricating a semiconductor device having a heat sink with an exposed surface
- 专利标题(中): 制造具有具有暴露表面的散热器的半导体器件的方法
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申请号: US12326462申请日: 2008-12-02
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公开(公告)号: US07820486B2公开(公告)日: 2010-10-26
- 发明人: Katsumi Ohtani
- 申请人: Katsumi Ohtani
- 申请人地址: JP Osaka
- 专利权人: Panasonic Corporation
- 当前专利权人: Panasonic Corporation
- 当前专利权人地址: JP Osaka
- 代理机构: Hamre, Schumann, Mueller & Larson, P.C.
- 优先权: JP2007-312589 20071203
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; H01L23/34
摘要:
A method includes: mounting a plurality of semiconductor elements on a substrate having wirings; connecting electrically electrodes of the semiconductor elements and the wirings; sealing the semiconductor elements with a resin, which is carried out by bringing a thermal conductor having a concavity and the substrate to be in contact with each other so that the semiconductor elements are positioned within the concavity and by filling the concavity with the resin; and separating respective semiconductor elements 1. In the resin-sealing step, in a state where the thermal conductor is arranged with its concavity facing up and the concavity of the thermal conductor is filled with a liquid resin, the semiconductor elements are dipped in the liquid resin in the concavity and the liquid resin is solidified. Due to these steps, a semiconductor device can be manufactured without experiencing troubles such as short circuit of the metal thin wires or imperfect filling of resin during the manufacturing steps, and thus semiconductor devices with stable quality can be manufactured.
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