发明授权
US07820516B2 Methods of manufacturing non-volatile memory devices having a vertical channel
有权
制造具有垂直通道的非易失性存储器件的方法
- 专利标题: Methods of manufacturing non-volatile memory devices having a vertical channel
- 专利标题(中): 制造具有垂直通道的非易失性存储器件的方法
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申请号: US11798563申请日: 2007-05-15
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公开(公告)号: US07820516B2公开(公告)日: 2010-10-26
- 发明人: Seung-Jin Yang , Hyok-ki Kwon , Yong-Seok Choi , Jeong-Uk Han
- 申请人: Seung-Jin Yang , Hyok-ki Kwon , Yong-Seok Choi , Jeong-Uk Han
- 申请人地址: KR Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Gyeonggi-do
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: KR10-2006-0059608 20060629
- 主分类号: H01L21/336
- IPC分类号: H01L21/336
摘要:
Disclosed are pairs of semiconductor flash memory cells including first and second source lines formed in a semiconductor substrate, semiconductor pillars extending from the substrate between the source lines, first and second charge storage structures formed on opposite side surfaces of the semiconductor pillar and separated by trench isolation structures. The x and y pitch separating adjacent semiconductor pillars in the memory cell array are selected whereby forming the trench isolation structures serves to separate both charge storage structures and conductive structures provided on opposite sides of a semiconductor pillars. Also disclosed are methods of fabricating such structures whereby the density of flash memory devices, particularly NOR flash memory devices, can be improved.
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