Invention Grant
- Patent Title: Plasma generator
- Patent Title (中): 等离子发生器
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Application No.: US10592286Application Date: 2005-02-17
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Publication No.: US07823537B2Publication Date: 2010-11-02
- Inventor: Yuichi Shiina , Hirofumi Takikawa
- Applicant: Yuichi Shiina , Hirofumi Takikawa
- Applicant Address: JP Tokyo JP Aichi
- Assignee: Ferrotec Corporation,Hirofumi Takikawa
- Current Assignee: Ferrotec Corporation,Hirofumi Takikawa
- Current Assignee Address: JP Tokyo JP Aichi
- Agent William L. Androlia; H. Henry Koda
- Priority: JP2004-075091 20040316
- International Application: PCT/JP2005/002477 WO 20050217
- International Announcement: WO2005/089031 WO 20050922
- Main IPC: C23C16/00
- IPC: C23C16/00

Abstract:
A plasma generator for forming a thin film comprises a cathode (4) for supplying constituent particles of an arc plasma and a trigger-and-anode (6) for starting and sustaining the arc plasma. The cathode surface (4a) of the cathode (4) is flat or finely irregular, and the anode surface (6c) of the trigger-and-anode (6) brought into contact with the cathode surface (4a) is flat. The anode surface (6c) is so arranged as to be brought into contact with the whole cathode surface (4a) when plasma is started. The contact point between a fine projection end (4b) of the cathode surface (4a) and the anode surface (6c) is made a plasma emission point. When the projection is consumed by plasma emission, another projection end which can be brought into contact with the anode surface (6c) is used as another plasma emission point, thus enabling intermittent operation of persistently repeating the sequence operation.
Public/Granted literature
- US20070193518A1 Plasma generator Public/Granted day:2007-08-23
Information query
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