Invention Grant
- Patent Title: Anti-fake identification device and method for making the same
- Patent Title (中): 防伪识别装置及其制作方法
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Application No.: US11967092Application Date: 2007-12-29
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Publication No.: US07823788B2Publication Date: 2010-11-02
- Inventor: Wei Li , Zhang-Geng Huang , Wan-Chun Zhao
- Applicant: Wei Li , Zhang-Geng Huang , Wan-Chun Zhao
- Applicant Address: CN ShenZhen, Guangdong Province HK Kowloon
- Assignee: Shenzhen Futaihong Precision Industry Co., Ltd.,FIH (Hong Kong) Limited
- Current Assignee: Shenzhen Futaihong Precision Industry Co., Ltd.,FIH (Hong Kong) Limited
- Current Assignee Address: CN ShenZhen, Guangdong Province HK Kowloon
- Agent Jeffrey T. Knapp
- Priority: CN200710201763 20070919
- Main IPC: G06K7/10
- IPC: G06K7/10
Abstract:
An anti-fake identification (14) includes a light-emitting layer (144) and a pattern layer (142). The light-emitting layer includes ultraviolet radiation photo initiator. The pattern layer has some through holes defined therein so as to form a pattern. Under ultraviolet radiation, the light-emitting layer emits light and the light passes through the pattern layer so as to show a pattern.
Public/Granted literature
- US20090072040A1 ANTI-FAKE IDENTIFICATION DEVICE AND METHOD FOR MAKING THE SAME Public/Granted day:2009-03-19
Information query
