Invention Grant
- Patent Title: Pattern based elaboration of hierarchical L3GO designs
- Patent Title (中): 基于模式的分层L3GO设计
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Application No.: US11695245Application Date: 2007-04-02
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Publication No.: US07823795B2Publication Date: 2010-11-02
- Inventor: Ulrich A. Finkler
- Applicant: Ulrich A. Finkler
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Hoffman Warnick LLC
- Agent Brian Verminski
- Main IPC: G06K19/06
- IPC: G06K19/06

Abstract:
A system, method and program product that utilizes flat pattern based L3GO elaboration in a hierarchical environment to create a nested conventional layout. A system is provide for processing a glyph layout to generate shapes for use in a VLSI (very large scale integrated circuit) design process, including: a hierarchical pattern search system that matches patterns from a pattern library to a set of glyph data, wherein the patterns have dependencies that cross hierarchical design boundaries; and a target shape generation system that selects patterns from a set of matching patterns and generates associated shapes.
Public/Granted literature
- US20080244493A1 PATTERN BASED ELABORATION OF HIERARCHICAL L3GO DESIGNS Public/Granted day:2008-10-02
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