Invention Grant
US07824146B2 Automated systems and methods for adapting semiconductor fabrication tools to process wafers of different diameters
有权
用于适应半导体制造工具以处理不同直径的晶片的自动化系统和方法
- Patent Title: Automated systems and methods for adapting semiconductor fabrication tools to process wafers of different diameters
- Patent Title (中): 用于适应半导体制造工具以处理不同直径的晶片的自动化系统和方法
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Application No.: US11851663Application Date: 2007-09-07
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Publication No.: US07824146B2Publication Date: 2010-11-02
- Inventor: Khamsidi Lanee , Gerry Moore
- Applicant: Khamsidi Lanee , Gerry Moore
- Applicant Address: US TX Austin
- Assignee: Advanced Technology Development Facility
- Current Assignee: Advanced Technology Development Facility
- Current Assignee Address: US TX Austin
- Agency: Fulbright & Jaworski L.L.P.
- Main IPC: H01L21/677
- IPC: H01L21/677

Abstract:
Automated systems and methods for adapting semiconductor fabrication tools to process wafers of different diameters are described. In one embodiment, a method comprises providing a semiconductor fabrication tool, placing an adapter ring on a plurality of ring holders via a robotic arm, the plurality of ring holders being operable to support the adapter ring at a vertical distance from a stage heater and the stage heater being movable in a vertical direction, placing a first semiconductor wafer on the stage heater via the robotic arm, the first semiconductor wafer having a first diameter, and moving the stage heater upward to receive the adapter ring from the plurality of ring holders and to cover a portion of the stage heater during processing of the first semiconductor wafer.
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