Invention Grant
- Patent Title: Method and apparatus for pressure swing adsorption
- Patent Title (中): 用于变压吸附的方法和装置
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Application No.: US12084622Application Date: 2006-02-23
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Publication No.: US07824472B2Publication Date: 2010-11-02
- Inventor: Tatsushi Urakami
- Applicant: Tatsushi Urakami
- Applicant Address: JP Tokyo
- Assignee: Taiyo Nippon Sanso Corporation
- Current Assignee: Taiyo Nippon Sanso Corporation
- Current Assignee Address: JP Tokyo
- Agency: Nixon & Vanderhye P.C.
- Priority: JP2005-328582 20051114
- International Application: PCT/JP2006/303306 WO 20060223
- International Announcement: WO2007/055035 WO 20070518
- Main IPC: B01D59/26
- IPC: B01D59/26

Abstract:
In order to provide a new PSA method which can concentrate simultaneously a strong adsorbate such as xenon and a weak adsorbate such as nitrogen in a high concentration with a high recovery percentage when highly valuable gas such as xenon and krypton contained in the exhaust gas from a semiconductor manufacturing equipment, etc. is recovered in a high concentration with a high recovery percentage, the present invention provides a new PSA method in which the method uses a separation apparatus comprising a lower column and a upper column which are filled with an adsorbent, a material gas storage tank for storing the material gas to be introduced into the lower column, a strong adsorbate storage tank for storing a main component which is easily adsorbed by the adsorbent, and a compressor, and the strong adsorbate which is easily adsorbed by the adsorbent and the weak adsorbate which is not readily adsorbed by the adsorbent are recovered, wherein the method comprises an (a) adsorption step, (b) rinse step, (c) low column depressurization step, (d) upper column depressurization step, and (e) purge step sequentially repeated based on a predetermined sequence.
Public/Granted literature
- US20090107331A1 Method and Apparatus for Pressure Swing Adsorption Public/Granted day:2009-04-30
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